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Proceedings Paper

Plasma-assisted pulsed laser deposition of titanium dioxide
Author(s): V. A. Shakhatov; Alessandro De Giacomo; V. D'Onghia; Aurora M. Losacco; Giuseppe Chita; Giovanni Bruno; Olga De Pascale
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Paper Abstract

TiO2 film deposition by PAPLD with biased substrates is investigated into a wide range of laser fluence and oxygen pressure. It is established that plasma of the r.f. discharge excited inside PLD chamber strongly affects the films properties. TiO2 films deposited by PAPLD were found better than those produced by the conventional PLD with regard to their morphology, optical properties, and uniformity. So, at the high values of Knudsen number (lambda) /L < 1 with an r.f. power of 70 Watt, PAPLD markedly improves the TiO2 film stoichiometry for high laser fluence, and the deposition rate increases with it up to 2 A/s.

Paper Details

Date Published: 25 February 2000
PDF: 7 pages
Proc. SPIE 4070, ALT '99 International Conference on Advanced Laser Technologies, (25 February 2000); doi: 10.1117/12.378185
Show Author Affiliations
V. A. Shakhatov, Ctr. Laser (Italy)
Alessandro De Giacomo, Univ. of Bari (Italy)
V. D'Onghia, Univ. of Bari (Italy)
Aurora M. Losacco, Ctr. Laser (Italy)
Giuseppe Chita, Ctr. Laser (Italy)
Giovanni Bruno, Istituto Nazionale Materiali Innovativi e Tecnologie Relative (France)
Olga De Pascale, Ctr. Laser (Italy)


Published in SPIE Proceedings Vol. 4070:
ALT '99 International Conference on Advanced Laser Technologies

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