Share Email Print
cover

Proceedings Paper

Effects of structural properties and electric field distribution on the laser-damage threshold of HfO2 thin films
Author(s): Maria Lucia Protopapa; Marco Alvisi; M. Di Giulio; Ferdinando De Tomasi; Maria Rita Perrone; G. Torsello; Antonio Valentini
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The joint effect of structural properties and electric field distribution on the laser damage threshold of HfO2 thin films is investigated in this work. Hafnium dioxide thin films of different optical thicknesses and with different structural properties have been realized employing two different deposition techniques: ion-assisted electron beam evaporation and dual-ion-beam sputtering technique. Laser damage thresholds of the sample have been measured at 308 nm by the photoacoustic beam deflection technique. It will be shown that samples presenting lower packing densities and lower peak values of the electric field intensity have higher damage threshold.

Paper Details

Date Published: 25 February 2000
PDF: 7 pages
Proc. SPIE 4070, ALT '99 International Conference on Advanced Laser Technologies, (25 February 2000); doi: 10.1117/12.378183
Show Author Affiliations
Maria Lucia Protopapa, INFM and Univ. of Lecce (Italy)
Marco Alvisi, CNRSM SCpA (Italy)
M. Di Giulio, INFM and Univ. of Lecce (Italy)
Ferdinando De Tomasi, INFM and Univ. of Lecce (Italy)
Maria Rita Perrone, INFM and Univ. of Lecce (Italy)
G. Torsello, INFM and Univ. of Lecce (Italy)
Antonio Valentini, INFM and Univ. of Bari (Italy)


Published in SPIE Proceedings Vol. 4070:
ALT '99 International Conference on Advanced Laser Technologies
Vladimir I. Pustovoy; Vitali I. Konov, Editor(s)

© SPIE. Terms of Use
Back to Top