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Proceedings Paper

Pulsed laser deposition of thin films on large substrates
Author(s): S. Acquaviva; M. Fernandez; Gilberto Leggieri; Armando Luches; Maurizio Martino; Alessio Perrone
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Paper Abstract

We have designed and built an ultra high vacuum chamber which allows thin film depositions on large area flat substrates and on 3D substrates by the pulsed laser deposition and reactive pulsed laser deposition techniques. Heating of substrates during and after film deposition is possible by using either resistive heaters or a lamp array. Metal and metal nitride and carbide were deposited on Si wafers, 3D steel substrates, teflon plates and paper sheets.

Paper Details

Date Published: 25 February 2000
PDF: 5 pages
Proc. SPIE 4070, ALT '99 International Conference on Advanced Laser Technologies, (25 February 2000); doi: 10.1117/12.378157
Show Author Affiliations
S. Acquaviva, INFM and Univ. of Lecce (Italy)
M. Fernandez, INFM and Univ. of Lecce (Italy)
Gilberto Leggieri, INFM and Univ. of Lecce (Italy)
Armando Luches, INFM and Univ. of Lecce (Italy)
Maurizio Martino, INFM and Univ. of Lecce (Italy)
Alessio Perrone, INFM and Univ. of Lecce (Italy)


Published in SPIE Proceedings Vol. 4070:
ALT '99 International Conference on Advanced Laser Technologies
Vladimir I. Pustovoy; Vitali I. Konov, Editor(s)

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