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Proceedings Paper

Advanced CD error detection with CD SEM disposition
Author(s): Darren Taylor; Barry Rockwell; Aihua Dong; Anthony Vacca; Waiman Ng; Geoffrey T. Anderson; William B. Howard
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Paper Abstract

In this study, we used production reticles and a new programmed defect test mask to characterize the sensitivity and false defect performance of several algorithms (ALM100, ALM200 and ALM300). ALM300's sensitivity spec is 60 nm. The inspection results were transferred to a CD SEM for analysis. SEM measurements were taken to validate the sensitivity of the algorithm and to quantify the calibration accuracy of the review tools of the inspection system.

Paper Details

Date Published: 3 February 2000
PDF: 10 pages
Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377115
Show Author Affiliations
Darren Taylor, Photronics, Inc. (United States)
Barry Rockwell, Photronics, Inc. (United States)
Aihua Dong, Photronics, Inc. (United States)
Anthony Vacca, KLA-Tencor Corp. (United States)
Waiman Ng, KLA-Tencor Corp. (United States)
Geoffrey T. Anderson, KLA-Tencor Corp. (United States)
William B. Howard, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 3996:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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