Share Email Print

Proceedings Paper

Mask fabrication by nanoimprint lithography using antisticking layers
Author(s): Hubert Schulz; Frank Osenberg; J. Engemann; Hella-Christin Scheer
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We have studied anti-sticking layers for nanoimprint lithography using different types of polymers, thermoplastic and thermosetting ones. Typically thermosetting polymers have higher mask selectivity in a fluorocarbon dry etch process than the thermoplastic polymers, but replication into these materials is much more complicated. We observe a high tendency for the polymer to adhere to the stamp. To minimize the sticking problem a fluorocarbon coating of the stamp was tested. It was deposited in a radio frequency plasma reactor with C4F8 as a feed gas. The thickness of the coating was several nm. It was characterized by contact angle measurement, XPS and FTIR analysis. Such coatings could successfully reduce sticking effects during an imprint process.

Paper Details

Date Published: 3 February 2000
PDF: 6 pages
Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377114
Show Author Affiliations
Hubert Schulz, Univ. Wuppertal (Germany)
Frank Osenberg, Univ. Wuppertal (Germany)
J. Engemann, Univ. Wuppertal (Germany)
Hella-Christin Scheer, Univ. Wuppertal (Germany)

Published in SPIE Proceedings Vol. 3996:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

© SPIE. Terms of Use
Back to Top