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Proceedings Paper

Lithography and CD performance of advanced MEBES mask pattern generators
Author(s): Jan M. Chabala; Damon M. Cole; Henry Thomas Pearce-Percy; Wayne Phillips; Maiying Lu; Suzanne Weaver; David W. Alexander; T. Coleman; Charles A. Sauer; Frank E. Abboud
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Paper Abstract

As optical lithography is extended to the 130 nm generation and beyond, demanding requirements are placed on mask pattern generators to produce quartz substrate masks. This paper reports on the lithography and critical dimension (CD) performance of the MEBES 5500 mask pattern generator. Compared to previous MEBES tools, this system employs a new high-dose electron gun and column design. We summarize experiments relating lithographic quality to increased dose and the effects of spot size on lithography. Methods to reduce beam-induced pattern placement errors are reviewed. A new graybeam writing strategy, Multipass Gray-II, is described in detail. This strategy creates eight dosed gray levels and provides increased writing throughput (up to 8X compared to single-pass printing) without loss of lithographic quality. These experiments are performed with ZEP 7000 resist and dry etch process; improvements in CD control have been achieved by optimizing the process. A consequence of the improvement in CD control and throughput is improved productivity in generating 180 nm devices.

Paper Details

Date Published: 3 February 2000
PDF: 16 pages
Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377110
Show Author Affiliations
Jan M. Chabala, Etec Systems, Inc. (United States)
Damon M. Cole, Etec Systems, Inc. (United States)
Henry Thomas Pearce-Percy, Etec Systems, Inc. (United States)
Wayne Phillips, Etec Systems, Inc. (United States)
Maiying Lu, Etec Systems, Inc. (United States)
Suzanne Weaver, Etec Systems, Inc. (United States)
David W. Alexander, Etec Systems, Inc. (United States)
T. Coleman, Etec Systems, Inc. (United States)
Charles A. Sauer, Etec Systems, Inc. (United States)
Frank E. Abboud, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 3996:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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