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Proceedings Paper

Advanced writing strategies for high-end mask making
Author(s): Melchior Lemke; Juergen Gramss; Hans-Joachim Doering; Hans Eichhorn; Gerhard Schubert
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Paper Abstract

In general the writing strategies of the Leica ZBA 320 tool are presented to the audience. Methods to achieve a high productivity in writing masks of the next generation are highlighted. Thus, such writing modes like variable-shaped beam using 6 shape types, vector scan and `writing-on-the- fly' are explained in their inter-action. Our strategies to constantly improve the accuracy parameters, such like n-pass writing and soft boundaries are not only described but also illustrated by our latest application results. Finally data processing by hierarchical data structures as the main factor to support the above-mentioned writing strategies is outlined in this paper.

Paper Details

Date Published: 3 February 2000
PDF: 9 pages
Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377107
Show Author Affiliations
Melchior Lemke, Leica Microsystems Lithography GmbH (Germany)
Juergen Gramss, Leica Microsystems Lithography GmbH (Germany)
Hans-Joachim Doering, Leica Microsystems Lithography GmbH (Germany)
Hans Eichhorn, Leica Microsystems Lithography GmbH (Germany)
Gerhard Schubert, Leica Microsystems Lithography GmbH (Germany)


Published in SPIE Proceedings Vol. 3996:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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