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Proceedings Paper

Defect printability and repair of alternating phase-shift masks
Author(s): Christoph M. Friedrich; Martin Verbeek; Leonhard Mader; Christian Crell; Rainer Pforr; Uwe A. Griesinger
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Paper Abstract

This paper will start with an overview of the different defect types which can occur on alternating phase shifting masks. A test mask with programmed defects of these different types was fabricated. The defect printability was investigated using an AIMS system. These results were correlated to first printing results in the wafer-fab. The results give an overview of the requirements for an inspection and repair system for alternating phase shifting masks. In order to get a better understanding of this printability behavior first simulations of defects using a 3D mask simulation tool were carried out and compared to the measurements. Several examples of quartz-repairs with different qualities are presented together with the influence on the aerial image.

Paper Details

Date Published: 3 February 2000
PDF: 12 pages
Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377104
Show Author Affiliations
Christoph M. Friedrich, Infineon Technologies AG (Germany)
Martin Verbeek, Infineon Technologies AG (Germany)
Leonhard Mader, Infineon Technologies AG (Germany)
Christian Crell, Infineon Technologies AG (Germany)
Rainer Pforr, Infineon Technologies AG (Germany)
Uwe A. Griesinger, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 3996:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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