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Proceedings Paper

Major improvements in mask CD metrology: enhanced performance on attenuated phase-shift masks, corner rounding measurements, and improved measurement automation
Author(s): Gerhard W.B. Schlueter; Gerd Scheuring; Guenther Falk; Hans-Juergen Brueck; Thomas Schaetz; Sigrid Lehnigk
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Paper Abstract

With continuously shrinking design rules enhanced techniques are required in mask manufacture which requires more sophisticated procedures for their characterization. As Phase Shift Masks (PSM) are of growing importance a new CD algorithm had to be developed to achieve the same or even higher level of CD accuracy and repeatability as on chrome masks. Major improvements in measurement performance on attenuated PSM have been achieved resulting from improving the PSM CD algorithm based on the experiences reported earlier. With shrinking feature sizes and masks layouts with denser patterns the quantification of corner rounding effects on contacts and line ends is of growing importance. Based on the algorithm developed for the effect of corner rounding on line end shortening a measurement procedure has been developed for contact holes. Measurement results have been shown. To further improving CD measurement automation and to enable easy measurement job modifications a highly flexible device has been developed to import measurement parameters into a macro template.

Paper Details

Date Published: 3 February 2000
PDF: 5 pages
Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377103
Show Author Affiliations
Gerhard W.B. Schlueter, Leica Microsystems Wetzlar GmbH (Germany)
Gerd Scheuring, MueTec GmbH (Germany)
Guenther Falk, MueTec GmbH (United States)
Hans-Juergen Brueck, MueTec GmbH (Germany)
Thomas Schaetz, Infineon Technologies AG (Germany)
Sigrid Lehnigk, Submicron Technologies GmbH (Germany)

Published in SPIE Proceedings Vol. 3996:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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