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Proceedings Paper

Mask quality (control) evaluation using the Virtual Stepper System (VSS)
Author(s): Linard Karklin; J. Tracy Weed; Junling Li
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Paper Abstract

The end of the millennium has seen the IC industry make the transition to the sub-wavelength arena. All indications are that the sub-wavelength environment is here to stay until the next generation lithography becomes available (see figure ).

Paper Details

Date Published: 3 February 2000
PDF: 3 pages
Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377101
Show Author Affiliations
Linard Karklin, Numerical Technologies, Inc. (United States)
J. Tracy Weed, Numerical Technologies, Inc. (United States)
Junling Li, Numerical Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 3996:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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