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Proceedings Paper

Stereolithography with XeCl excimer laser/lamp
Author(s): Saburoh Satoh; Takao Tanaka; Satoshi Ihara; Chobei Yamabe
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Paper Abstract

For the stereo-lithography, XeCl excimer laser has been adapted to improve the utilization efficiency of laser energy. Because of the beam uniformity was made better by a homogenizer, the quantity of cured resin per laser energy was increased compare than that without the homogenizer. With this method a simple 3D object was created, and its was proved that XeCl excimer laser was possible to apply for the stereo- lithography.

Paper Details

Date Published: 7 February 2000
PDF: 8 pages
Proc. SPIE 3888, High-Power Lasers in Manufacturing, (7 February 2000); doi: 10.1117/12.377028
Show Author Affiliations
Saburoh Satoh, Saga Univ. (Japan)
Takao Tanaka, Saga Univ. (Japan)
Satoshi Ihara, Saga Univ. (Japan)
Chobei Yamabe, Saga Univ. (Japan)


Published in SPIE Proceedings Vol. 3888:
High-Power Lasers in Manufacturing
Xiangli Chen; Tomoo Fujioka; Akira Matsunawa, Editor(s)

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