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Proceedings Paper

Soft x-ray narrow-band laser plasma sources for nanotechnology
Author(s): Ronan Faulkner; Gerard D. O'Sullivan; Dave O'Reilly; Padraig Dunne
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Paper Abstract

The emission from laser produced plasma has been employed as a source of soft X-ray radiation for nanotechnology. By incorporating high Z elements into low Z solid hosts, targets have been fabricated which, when illuminated with high power Nd:YAG laser pulses, emit a significant proportion of the incident energy in a narrow wavelength region, with reduced continuum emission in the adjacent spectrum. Such a source would be of considerable utility in a projection lithography setup, where the presence of multilayer optics prevents the use of broadband soft X-ray sources. Cesium, barium and cerium were incorporated into different targets, resulting in different peak wavelengths for the emission. 4d - 4f transitions in highly ionized species have been identified as being responsible for the narrow emission feature. In addition, efforts to reduce particulate debris from the target are reported.

Paper Details

Date Published: 25 January 2000
PDF: 5 pages
Proc. SPIE 4064, Third International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (25 January 2000); doi: 10.1117/12.375441
Show Author Affiliations
Ronan Faulkner, Univ. College Dublin (Ireland)
Gerard D. O'Sullivan, Univ. College Dublin (Ireland)
Dave O'Reilly, Univ. College Dublin (Ireland)
Padraig Dunne, Univ. College Dublin (Ireland)


Published in SPIE Proceedings Vol. 4064:
Third International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering
Alexander I. Melker, Editor(s)

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