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Proceedings Paper

Laser-plasma x-ray source using gas-target mixed fine particle
Author(s): Tetsuya Matsui; Nobuyoshi Kogawa
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Paper Abstract

We are developing laser plasma x-ray source for the extreme UV lithography. Our main idea is than fine particles, which sizes ar much smaller than the laser focal spot size, are used for the target of LPS. It is possible that this method has the higher x-ray conversion efficiency and low debris effect. Before the verification of this idea, the characteristics of LPS using the only gas puff target were investigated and tried the 100 Hz gas puff continuous operation until 106 shots. In this operation, the long- term stability of the x-ray signal from 105 shots to 106 shots was about +/- 8 percent. In order to confirm our idea, we have selected SnO2 fine particle that had a strong peak at 13.8 nm. It has found that the target of the gas mixed SnO2 fine particle had two times higher x-ray intensity than the only Xe gas target at 13.6-14.0 nm. Therefore, it seems suitable for the Mo/Si multi-layer mirror system.

Paper Details

Date Published: 11 January 2000
PDF: 8 pages
Proc. SPIE 3886, High-Power Lasers in Energy Engineering, (11 January 2000); doi: 10.1117/12.375160
Show Author Affiliations
Tetsuya Matsui, Hitachi, Ltd. (Japan)
Nobuyoshi Kogawa, Hitachi, Ltd. (Japan)

Published in SPIE Proceedings Vol. 3886:
High-Power Lasers in Energy Engineering
Kunioki Mima; Gerald L. Kulcinski; William J. Hogan, Editor(s)

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