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Proceedings Paper

Electrical properties of some plasma polymers obtained by remote microwave plasma chemical vapor deposition
Author(s): M. Wlodarska; E. Staryga; A. Walkiewicz-Pietrzykowska; Grzegorz W. Bak; M. Buczkowska; A. Wrobel
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Paper Abstract

Some electrical properties of amorphous hydrogenated silicon-carbon films produced by remote microwave hydrogen plasma chemical vapor deposition technique are discussed. The DC conduction of Al/a-Si:C:H/Au and Al/a-Si:C:H/n-Si structures has been measured. Dielectric response of these structures has also been examined. The films are weakly conducting materials with the activation energy of the conductivity equal to 0.28 eV and 0.03 eV and 0.03 eV. MIS structures containing the amorphous silicon-carbon films as an insulator show the influence of trapping phenomena at the insulator-silicon interface.

Paper Details

Date Published: 14 December 1999
PDF: 5 pages
Proc. SPIE 4017, Polymers and Liquid Crystals, (14 December 1999); doi: 10.1117/12.373689
Show Author Affiliations
M. Wlodarska, Technical Univ. of Lodz (Poland)
E. Staryga, Technical Univ. of Lodz (Poland)
A. Walkiewicz-Pietrzykowska, Ctr. of Molecular and Macromolecular Studies (Poland)
Grzegorz W. Bak, Technical Univ. of Lodz (Poland)
M. Buczkowska, Technical Univ. of Lodz (Poland)
A. Wrobel, Ctr. of Molecular and Macromolecular Studies (Poland)

Published in SPIE Proceedings Vol. 4017:
Polymers and Liquid Crystals
Andrzej Wlochowicz, Editor(s)

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