Share Email Print
cover

Proceedings Paper

Extreme-UV lithography: a candidate for next-generation lithography
Author(s): Joseph J. M. Braat
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We present a short overview of optical designs for projection systems to be used in Extreme UV lithography, a technique that is considered to be one of the potential successors to classical optical lithography. Typical state- of-the-art designs are presented with special emphasis on the peculiarities of ring-field projection systems. The specific properties of some new design developed by the present author will be discussed.

Paper Details

Date Published: 29 December 1999
PDF: 6 pages
Proc. SPIE 4016, Photonics, Devices, and Systems, (29 December 1999); doi: 10.1117/12.373596
Show Author Affiliations
Joseph J. M. Braat, Delft Univ. of Technology (Netherlands)


Published in SPIE Proceedings Vol. 4016:
Photonics, Devices, and Systems
Miroslav Hrabovsky; Pavel Tomanek; Miroslav Miler, Editor(s)

© SPIE. Terms of Use
Back to Top