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Proceedings Paper

Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM
Author(s): JoHyun Park; Yong-Hoon Kim; Sung-Chul Lim; Kyung Hee Lee; Seong-Woon Choi; Hee-Sun Yoon; Jung-Min Sohn
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Paper Abstract

The effect of lens aberration in projection system is simulated for 0.2 micrometer isolated contact holes and 0.2 micrometer line/space patterns with conventional binary mask, 5% and 20% attenuated phase-shift-mask. The spherical aberration affects CD variation through focus on the 0.2 micrometer isolated contact holes for a 20% attenuated phase- shift-mask. Phase compensation is needed to minimize the CD variation. Line/space patterns are found to be insensitive to the spherical aberration. The comatic aberration is harmful for features as small as 0.2 micrometer line/space pairs. To satisfy the tolerance of 30 nm CD difference, the comatic aberration must be less than 0.05 (lambda) . The effect of astigmatism is negligible compared to the comatic aberration.

Paper Details

Date Published: 30 December 1999
PDF: 6 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373385
Show Author Affiliations
JoHyun Park, Samsung Electronics (South Korea)
Yong-Hoon Kim, Samsung Electronics Co., Ltd. (South Korea)
Sung-Chul Lim, Samsung Electronics Co., Ltd. (South Korea)
Kyung Hee Lee, Samsung Electronics Co., Ltd. (South Korea)
Seong-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Hee-Sun Yoon, Samsung Electronics Co., Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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