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Proceedings Paper

Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet lithography
Author(s): Seongtae Jeong; Chih-wei Lai; Senajith Rekawa; Christopher C. Walton; Shon T. Prisbrey; Jeffrey Bokor
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Paper Abstract

We present recent experimental results from an actinic (operates at the EUV wavelength) defect inspection system for extreme ultraviolet lithography mask blanks. A method to cross-register and cross-correlate between the actinic inspection system and a commercial visible-light scattering defect inspection system is demonstrated. Thus, random, real defects detected using the visible-light scattering inspection tool can be found and studied by our actinic inspection tool. Several defects with sub-100 nm size (as classified by the visible scattering tool) are found with the actinic inspection tool with a good signal to noise ratio. This result demonstrates the capability of the actinic inspection tool for independent defect counting experiments at a sub-100 nm defect sensitivity level.

Paper Details

Date Published: 30 December 1999
PDF: 8 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373375
Show Author Affiliations
Seongtae Jeong, Lawrence Berkeley National Lab. (United States)
Chih-wei Lai, Univ. of California/Berkeley (United States)
Senajith Rekawa, Lawrence Berkeley National Lab. (United States)
Christopher C. Walton, Lawrence Livermore National Lab. (United States)
Shon T. Prisbrey, Lawrence Livermore National Lab. (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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