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Proceedings Paper

Damage control during dry etching of EUV mask: I. Control of surface roughness
Author(s): Eiichi Hoshino; Taro Ogawa; Masashi Takahashi; Hiromasa Hoko; Hiromasa Yamanashi; Naoya Hirano; Shinji Okazaki
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Paper Abstract

To obtain good optical properties in an EUVL mask, the substrate should not suffer any damage either during mask fabrication or during use. As one step in ensuring that this is the case, the surface roughness of patterns etched on a mask substrate was examined, since it reduces the reflectance of the substrate. The experiments involved coating a Mo/Si multilayer with a SiO2 buffer layer and a Ta absorber layer. After the absorber was dry etched with a mixture of Cl2 and BCl3 gases, dry etching was used to over-etch the buffer layer. It was found that dry etching with Cl2 + BCl3 provides both a smooth Ta surface (roughness: less than 1 nm rms) and good control of the etching depth, even though the Ta etching rate was very high (389.6 nm/min.). The results indicate that the process used in this study is quite suitable for making absorber patterns.

Paper Details

Date Published: 30 December 1999
PDF: 6 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373372
Show Author Affiliations
Eiichi Hoshino, Association of Super-Advanced Electronics Technologies (Japan)
Taro Ogawa, Association of Super-Advanced Electronics Technologies (Japan)
Masashi Takahashi, Association of Super-Advanced Electronics Technologies (Japan)
Hiromasa Hoko, Association of Super-Advanced Electronics Technologies (Japan)
Hiromasa Yamanashi, Association of Super-Advanced Electronics Technologies (Japan)
Naoya Hirano, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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