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Proceedings Paper

Using linear programming to improve the determination of photomask magnification and orthogonality corrections
Author(s): Mark D. Cerio
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Paper Abstract

A method of improving the determination of photomask magnification and orthogonality corrections using linear programming (LP) is presented. The method discusses the inadequacies of the current methods and how LP modeling provides a more rigorous approach for determining the optimum corrections for an arbitrary set of customers, lithography tools, and cassettes. A detailed description is provided of the LP model formulation. A sample problem is discussed using actual production data to show one such set of corrections and an estimate is provided of the improvement that can be achieved with their implementation. Finally, possible refinements to the model are discussed along with suggestions regarding the technique's incorporation into a software application.

Paper Details

Date Published: 30 December 1999
PDF: 8 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373370
Show Author Affiliations
Mark D. Cerio, DuPont Photomasks, Inc. (United States)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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