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Proceedings Paper

Line-width uniformity verification for 0.18-um and below design rule reticles
Author(s): TaiSheng Tan; Shen Chung Kuo; Wayne P. Shen; Nathan Schumann; Clare Wu
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Paper Abstract

A revolutionary CD error detection tool, the linewidth bias measurement (LBM), has been developed by the PDC group of Applied Material to solve the localized CD error detection issue for 0.18 micrometer and below design rule reticles. In this paper, we discussed, characterized and tested the LBM tool on both designed testers and real production reticles. Several potential applications have been demonstrated and discussed.

Paper Details

Date Published: 30 December 1999
PDF: 6 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373368
Show Author Affiliations
TaiSheng Tan, Taiwan Mask Corp (Taiwan)
Shen Chung Kuo, Taiwan Mask Corp. (Taiwan)
Wayne P. Shen, Taiwan Mask Corp. (United States)
Nathan Schumann, Applied Materials (United States)
Clare Wu, Applied Materials (Taiwan)

Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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