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Proceedings Paper

Incorporation of laser proximity correction into mask production
Author(s): Anja Rosenbusch; James Unruh; Hartmut Kirsch; David Y. Chan
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Paper Abstract

The incorporation of laser proximity correction into mask production is presented. The ALTA 3000 has been chosen for demonstration. The goal is to improve pattern fidelity of the ALTA 3000 to a level comparable to the ALTA 3500. This provides the possibility to shift production from the ALTA 3500 to the ALTA 3000 and extends the lifetime of an ALTA 3000. The paper focuses on demonstrating different applications and the incorporation into the standard mask production flow.

Paper Details

Date Published: 30 December 1999
PDF: 10 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373347
Show Author Affiliations
Anja Rosenbusch, SIGMA-C (United States)
James Unruh, Photronics, Inc. (United States)
Hartmut Kirsch, SIGMA-C (United States)
David Y. Chan, Photronics, Inc. (United States)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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