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Proceedings Paper

Traceability, reproducibility, and comparability of grid calibrations
Author(s): Harald Bosse; Wolfgang Haessler-Grohne; Bernd Brendel
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Paper Abstract

The national metrology institute of Germany, PTB, offers traceable, two-dimensional pattern placement calibrations of microstructures on masks. Whereas the measurement uncertainty for the calibrated pattern positions in terms of traceable coordinate values is only comparable to the position tolerances actually required for mask patterning, i.e. about 35 nm, the deviations from the design grid can be determined with smaller uncertainties. In calibration certificates offered by PTB, these differences are taken into account and the uncertainties for the length of the grid and the uncertainties for the position deviations from the design grid are quoted separately as 30 nm and 10 nm respectively. Developments to further reduce the uncertainties are under way. An analysis of photomask recalibration results shows the long-term reproducibility of PTB length calibrations to be better than 15 nm or 1*10-7, including substrate stability effects. Details of the recalibration results will be given. Leica Microsystems Lithography runs a laboratory for two-dimensional pattern placement calibrations, formally accredited by PTB within DKD, the German calibration service. Results of recent comparison measurements between the DKD laboratory and PTB on masks of different size will be given and discussed as an example of the process of dissemination of the length unit to industry.

Paper Details

Date Published: 30 December 1999
PDF: 7 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373342
Show Author Affiliations
Harald Bosse, Physikalisch-Technische Bundesanstalt (Germany)
Wolfgang Haessler-Grohne, Physikalisch-Technische Bundesanstalt (Germany)
Bernd Brendel, Leica Microsystems Lithography GmbH (Germany)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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