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Proceedings Paper

System architecture choices for an advanced mask writer (100 to 130 nm)
Author(s): Varoujan Chakarian; Frederick Raymond; Charles A. Sauer; Sergey V. Babin; Robert Innes; Allan L. Sagle; Ulrich Hofmann; Bassam Shamoun; David Trost; Abe Ghanbari; Frank E. Abboud
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Paper Abstract

System architecture choices for an advanced mask writer (100 - 130 nm) have been evaluated. To compare and contrast variably shaped beam vector architecture with raster-based architecture, factors such as beam accelerating voltage and its effects on lithographic performance and system throughput for complex patterns have been studied. The results indicate that while both architectures have strengths and weaknesses, in the final analysis, raster-based systems offer the best combination of benefits to the user in terms of versatility and overall system throughput. Furthermore, other system requirements needed to support the challenges of the next generation mask writers are discussed. An architecture that includes a 50 kV raster graybeam (RGB), based architecture, a new writing strategy, a new stage system, an advanced environmental/thermal control management system, an automated material handling system, and a new resist and process is proposed.

Paper Details

Date Published: 30 December 1999
PDF: 15 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373318
Show Author Affiliations
Varoujan Chakarian, Etec Systems, Inc. (United States)
Frederick Raymond, Etec Systems, Inc. (United States)
Charles A. Sauer, Etec Systems, Inc. (United States)
Sergey V. Babin, Etec Systems, Inc. (United States)
Robert Innes, Etec Systems, Inc. (United States)
Allan L. Sagle, Etec Systems, Inc. (United States)
Ulrich Hofmann, Etec Systems, Inc. (United States)
Bassam Shamoun, Etec Systems, Inc. (United States)
David Trost, Etec Systems, Inc. (United States)
Abe Ghanbari, Etec Systems, Inc. (United States)
Frank E. Abboud, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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