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Proceedings Paper

MEEF in theory and practice
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Paper Abstract

The Mask Error Enhancement Function (MEEF) serves to amplify reticle errors. This can lead to proximity effects and bias problems that are much larger than would be expected from the normal reduction factor of the imaging system. The economic impact on reticle specifications can be severe. This paper examines the theoretical description of the MEEF for dark features: isolated lines, isolated posts, and dense 1:1 line/space features. MEEF for dense features is found in general to be smaller than 1 over a wide range, while MEEF for isolated features is always greater than 1. This 'MEEF Gap' between isolated and dense features may help to explain the sensitivity of OPC to isolated and dense bias.

Paper Details

Date Published: 30 December 1999
PDF: 14 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373313
Show Author Affiliations
Franklin M. Schellenberg, Mentor Graphics Corp. (United States)
Chris A. Mack, FINLE Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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