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Proceedings Paper

High-transmission PSM inspection sensitivity
Author(s): Chunhung Wu; David Wang; Chien-Ming Wang; Li-Jui Chen; Shuo-Yen Chou; Clare Wu; Nathan Schumann; Reuven Falah; Wolfgang Staud
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Paper Abstract

Manufacturing of reticles, which combine both OPC and PSM, is becoming more and more challenge. Materials cost is high, several accurate writing processes are needed and repair is almost impossible. This makes inspection a critical and very complicated process. This study describes an inspection of a test vehicle consisting of 55 cells targeted for sub- wavelength design rule technology. This study describes an inspection of the 55 cells test plate targeted for 0.17 micrometer design rule technology. The plate is written on a MoSi layer with 18% transmission for 248 nm lithography. The MoSi has higher transmittance in I-line and G-line that reduces the contrast between the MoSi and the glass (relative to the usual contrast in binary plates). The technique for inspection by Applied Materials RT8000ES 436nm die-to-database is described. The technique is based on expansion of the reduced dynamic range of gray level that results from the lower contracts, re-gaining the inspection capability. This paper reviews the results of G-line versus I-line inspection of high transmission PSM and describes the method of the sensitivity verification including CD defects analysis.

Paper Details

Date Published: 30 December 1999
PDF: 10 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373307
Show Author Affiliations
Chunhung Wu, Precision Semiconductor Mask Corp. (Taiwan)
David Wang, Precision Semiconductor Mask Corp. (Singapore)
Chien-Ming Wang, Industrial Technology Research Institute (Taiwan)
Li-Jui Chen, Industrial Technology Research Institute (Taiwan)
Shuo-Yen Chou, Industrial Technology Research Institute (Taiwan)
Clare Wu, Applied Materials (Taiwan)
Nathan Schumann, Applied Materials (United States)
Reuven Falah, Applied Materials (Israel)
Wolfgang Staud, Applied Materials (United States)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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