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Proceedings Paper

Advanced mask technology for 230-mm reticle fabrication
Author(s): Koji Hiruta; Shinji Kubo; Takayuki Iwamatsu; Tatsuya Fujisawa; Masao Sugiyama; Hiroaki Morimoto
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Paper Abstract

This work demonstrated the ability of 230 mm reticle manufacture by a current technology. The CD accuracy of 17 nm (3 (sigma) ) and image placement accuracy of 30 nm (3 (sigma) ) were obtained in the 230 mm reticle. It was able to be confirmed that there was no big problem though the improvement was still necessary for manufacturing equipment of 230 mm reticle.

Paper Details

Date Published: 30 December 1999
PDF: 5 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373294
Show Author Affiliations
Koji Hiruta, Semiconductor Leading Edge Technologies, Inc. (Japan)
Shinji Kubo, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takayuki Iwamatsu, Semiconductor Leading Edge Technologies, Inc. (Japan)
Tatsuya Fujisawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Masao Sugiyama, Semiconductor Leading Edge Technologies, Inc. (Japan)
Hiroaki Morimoto, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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