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Proceedings Paper

Absorbing assist pattern technique (A2PT) for effective sidelobe control for attenuated phase-shifting masks in optical projection lithography
Author(s): Rainer Pforr; Fritz Gans; Juergen Knobloch; Joerg Thiele
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Paper Abstract

A novel technique of sidelobe suppression based on absorbing assist pattern is introduced. Chrome shields are placed exactly at the position, where sidelobes appear. The effectiveness of this technique for sidelobe control is demonstrated by simulation and experimental results. The resulting process window enlargement for 180 nm contacts is investigated. Corresponding mask making issues are discussed.

Paper Details

Date Published: 30 December 1999
PDF: 5 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373289
Show Author Affiliations
Rainer Pforr, Infineon Technologies AG (Germany)
Fritz Gans, Infineon Technologies AG (Germany)
Juergen Knobloch, Infineon Technologies AG (Germany)
Joerg Thiele, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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