Share Email Print
cover

Proceedings Paper

Grating pitch measurements with the molecular measuring machine
Author(s): John Kramar; Jau-Shi Jay Jun; William B. Penzes; Fredric Scire; E. Clayton Teague; John S. Villarrubia
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by 50 mm area. The instrument uses a scanning tunneling microscope to probe the surface and an interferometer system to measure the lateral probe movement, both having sub-nanometer resolution. The continuous vertical measurement range is 5 micrometer, and up to 2 mm can be covered by stitching overlapping ranges. The instrument includes temperature control with millikelvin stability, an ultra-high vacuum environment with a base pressure below 10-5 Pa, and seismic and acoustic vibration isolation. Pitch measurements were performed on gratings made by holographic exposure of photoresist and on gratings made by laser-focused atomic deposition of Cr. The line pitch for these gratings ranged from 200 nm to 400 nm with an estimated standard uncertainty of the average pitch of 25 X 10-6. This fractional uncertainty is derived from an analysis of the sources of uncertainty for a 1 mm point-to- point measurement, including the effects of alignment, Abbe offset, motion cross-coupling, and temperature variations. These grating pitch measurements are uniquely accomplished on M3 because of the combination of probe resolution and long-range interferometer-controlled stage. This instrument could uniquely address certain dimensional metrology needs in the data storage industry.

Paper Details

Date Published: 30 November 1999
PDF: 8 pages
Proc. SPIE 3806, Recent Advances in Metrology, Characterization, and Standards for Optical Digital Data Disks, (30 November 1999); doi: 10.1117/12.371144
Show Author Affiliations
John Kramar, Manufacturing Engineering Lab./National Institute of Standards and Technology (United States)
Jau-Shi Jay Jun, Manufacturing Engineering Lab./National Institute of Standards and Technology (United States)
William B. Penzes, Manufacturing Engineering Lab./National Institute of Standards and Technology (United States)
Fredric Scire, Manufacturing Engineering Lab./National Institute of Standards and Technology (United States)
E. Clayton Teague, Manufacturing Engineering Lab./National Institute of Standards and Technology (United States)
John S. Villarrubia, Manufacturing Engineering Lab./National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 3806:
Recent Advances in Metrology, Characterization, and Standards for Optical Digital Data Disks
Fernando Luis Podio, Editor(s)

© SPIE. Terms of Use
Back to Top