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Proceedings Paper

Polycapillary collimator for laser-generated plasma source x-ray lithography
Author(s): Zewu Chen; Russell Youngman; Tom Bievenue; Qi-Fan Xiao; I. C. Edmond Turcu; Robert K. Grygier; Stanley Mrowka
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Paper Abstract

Collimating of the x-ray beam is essential to point source proximity x-ray lithography for controlling radial magnification and increasing the beam intensity. Polycapillary optic collimators were developed to meet the challenges of point source proximity x-ray lithography. Sophisticated modeling software was developed for design and optimization of polycapillary collimators to meet specific requirements. Using this software, a highly efficient collimator was designed to deliver a well-collimated beam centered at 1.1 keV for a 20 mm X 20 mm field. The collimator was constructed and was tested with both an electron bombardment source and a laser generated plasma source. The design goals of intensity gain and divergence controls have been achieved. The intensity variation within the printing field can be less than 2%.

Paper Details

Date Published: 23 November 1999
PDF: 7 pages
Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371136
Show Author Affiliations
Zewu Chen, X-Ray Optical Systems Inc. (United States)
Russell Youngman, X-Ray Optical Systems Inc. (United States)
Tom Bievenue, X-Ray Optical Systems Inc. (United States)
Qi-Fan Xiao, X-Ray Optical Systems Inc. (United States)
I. C. Edmond Turcu, JMAR Technologies, Inc. (United States)
Robert K. Grygier, JMAR Technologies, Inc. (United States)
Stanley Mrowka, Oxford Research Group (United States)


Published in SPIE Proceedings Vol. 3767:
EUV, X-Ray, and Neutron Optics and Sources
Carolyn A. MacDonald; Kenneth A. Goldberg; Juan R. Maldonado; Huaiyu Heather Chen-Mayer; Stephen P. Vernon, Editor(s)

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