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Proceedings Paper

Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser
Author(s): Sarah Bollanti; Paolo Di Lazzaro; Francesco Flora; Tommaso Letardi; Alessandro Marinai; Alessandro Nottola; Kostandia Vigli-Papadaki; A. Vitali; Francesca Bonfigli; Nicola Lisi; Libero Palladino; Armando Reale; Cheng En Zheng
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Paper Abstract

We present the exciting results obtained by using a natural (i.e. as long as the active medium gain) 120 ns-duration excimer laser pulse focused on relatively thick targets (100 micrometer): a conversion efficiency exceeding 20% has been obtained in the 40 - 70 eV (170 - 300 Angstrom) spectral interval from Cu and Ta targets, with more than 100-ns-FWHM X- ray pulses and low speed (less than 100 m/s) emitted debris. A fast CCD camera is used to reveal the debris and to measure their speed for different laser parameters. These values of debris speed are compatible with the use of a mechanical device to separate them from the X-ray beam and hence to protect the optics of a projection-microlithography system.

Paper Details

Date Published: 23 November 1999
PDF: 12 pages
Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371128
Show Author Affiliations
Sarah Bollanti, ENEA Frascati (Italy)
Paolo Di Lazzaro, ENEA Frascati (Italy)
Francesco Flora, ENEA Frascati (Italy)
Tommaso Letardi, ENEA Frascati (Italy)
Alessandro Marinai, ENEA Frascati (Italy)
Alessandro Nottola, ENEA Frascati (Italy)
Kostandia Vigli-Papadaki, ENEA Frascati (Italy)
A. Vitali, ENEA Frascati (Italy)
Francesca Bonfigli, EL.EN. SpA (Italy)
Nicola Lisi, European Organization for Nuclear Research (Switzerland)
Libero Palladino, INFM/Univ. degli Studi dell'Aquila and LNGS-INFN (Italy)
Armando Reale, INFM/Univ. degli Studi dell'Aquila and LNGS-INFN (Italy)
Cheng En Zheng, EL.EN. SpA (Italy)


Published in SPIE Proceedings Vol. 3767:
EUV, X-Ray, and Neutron Optics and Sources
Carolyn A. MacDonald; Kenneth A. Goldberg; Juan R. Maldonado; Huaiyu Heather Chen-Mayer; Stephen P. Vernon, Editor(s)

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