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Proceedings Paper

Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography
Author(s): Sasa Bajt; Ricke D. Behymer; Paul B. Mirkarimi; Claude Montcalm; Mark A. Wall; Marco Wedowski; James A. Folta
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Paper Abstract

The performance of beryllium-based multilayer coatings designed to reflect light of wavelengths near 11 nm, at normal incidence, is presented. These multilayer coatings are of special interest for extreme ultraviolet lithography (EUVL). The beryllium-based multilayers investigated were Mo/Be, Ru/Be and a new material combination Mo2C/Be. The highest reflectivity achieved so far is 70% at 11.3 nm with 70 bilayers of Mo/Be. However, even though high reflectivity is very important, there are other parameters to satisfy the requirements for an EUVL production tool. Multilayer stress, thermal stability, radiation stability and long term reflectance stability are of equal or greater importance. An experimental characterization of several coatings was carried out to determine the reflectivity, stress, microstructure, and long term stability of these coatings. Theoretically calculated reflectivities are compared with experimental results for different material pairs; differences between experimental and theoretical reflectivities and bandwidths are addressed.

Paper Details

Date Published: 23 November 1999
PDF: 12 pages
Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371125
Show Author Affiliations
Sasa Bajt, Lawrence Livermore National Lab. (United States)
Ricke D. Behymer, Lawrence Livermore National Lab. (United States)
Paul B. Mirkarimi, Lawrence Livermore National Lab. (United States)
Claude Montcalm, Lawrence Livermore National Lab. (United States)
Mark A. Wall, Lawrence Livermore National Lab. (United States)
Marco Wedowski, Lawrence Livermore National Lab. (Germany)
James A. Folta, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 3767:
EUV, X-Ray, and Neutron Optics and Sources
Carolyn A. MacDonald; Kenneth A. Goldberg; Juan R. Maldonado; Huaiyu Heather Chen-Mayer; Stephen P. Vernon, Editor(s)

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