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Proceedings Paper

Development of soft x-ray multilayer mirrors for a wavelength of 3 nm
Author(s): Kiwamu Sakano; Masaki Yamamoto
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Paper Abstract

Fabrication process of soft X-ray multilayer mirrors composed of Sc/Cr having shown high reflectances above 10% including the highest 14.8% for a wavelength of 3 nm is described. The multilayers were prepared by ion beam sputtering of an electron cyclotron resonance type enabling sputter deposition at the highest vacuum of 0.03m Torr. The multilayers were prepared at a stable deposition rate within 4 hours to suppress period instability and also at various substrate temperatures to find the best condition to suppress the interface roughness.

Paper Details

Date Published: 23 November 1999
PDF: 4 pages
Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371122
Show Author Affiliations
Kiwamu Sakano, Tohoku Univ. (Japan)
Masaki Yamamoto, Tohoku Univ. (Japan)

Published in SPIE Proceedings Vol. 3767:
EUV, X-Ray, and Neutron Optics and Sources
Carolyn A. MacDonald; Kenneth A. Goldberg; Juan R. Maldonado; Huaiyu Heather Chen-Mayer; Stephen P. Vernon, Editor(s)

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