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Proceedings Paper

Recent advances in EUV phase-shifting point diffraction interferometry
Author(s): Patrick P. Naulleau; Kenneth A. Goldberg; Sang Hun Lee; Chang-Hasnain C. Chang; Phillip J. Batson; David T. Attwood; Jeffrey Bokor
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Paper Abstract

The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) was developed and implemented at Lawrence Berkeley National Laboratory to meet the significant measurement challenge of characterizing EUV projection lithography optics. The PS/PDI has been in continuous use and under ongoing development since 1996. Here we describe recent improvements made to the interferometer, and we summarize metrology results from state-of-the-art 10x-reduction EUV projection optics.

Paper Details

Date Published: 23 November 1999
PDF: 10 pages
Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371113
Show Author Affiliations
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Sang Hun Lee, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Chang-Hasnain C. Chang, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Phillip J. Batson, Lawrence Berkeley National Lab. (United States)
David T. Attwood, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 3767:
EUV, X-Ray, and Neutron Optics and Sources
Carolyn A. MacDonald; Kenneth A. Goldberg; Juan R. Maldonado; Huaiyu Heather Chen-Mayer; Stephen P. Vernon, Editor(s)

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