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Proceedings Paper

Liquid-target laser-plasma sources for EUV and x-ray lithography
Author(s): Hans M. Hertz; Magnus Berglund; Bjoern A. M. Hansson; Lars Rymell
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Paper Abstract

We review the development of compact laser-plasma soft x-ray sources based on microscopic liquid drops or liquid jets as target. It is shown that such sources provide practically debris-free, high-flux operation at wavelengths suitable for EUV and x-ray lithography. This regenerative and liquid- density target system holds promise for high-average power x- ray and EUV generation using high-repetition-rate lasers. Application of the method to compact x-ray microscopy is also briefly discussed.

Paper Details

Date Published: 23 November 1999
PDF: 8 pages
Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371104
Show Author Affiliations
Hans M. Hertz, Royal Institute of Technology (Sweden)
Magnus Berglund, Royal Institute of Technology (Sweden)
Bjoern A. M. Hansson, Royal Institute of Technology (Sweden)
Lars Rymell, Royal Institute of Technology (Sweden)

Published in SPIE Proceedings Vol. 3767:
EUV, X-Ray, and Neutron Optics and Sources
Carolyn A. MacDonald; Kenneth A. Goldberg; Juan R. Maldonado; Huaiyu Heather Chen-Mayer; Stephen P. Vernon, Editor(s)

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