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Proceedings Paper

Preparation and properties of organically modified sol-gel silica/titania optical waveguides
Author(s): Wenxiu Que; Yan Zhou; Yee Loy Lam; Shi De Cheng; Yuen Chuen Chan; Chan Hin Kam; Liping Zhao; Srinivasa Buddhudu
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Paper Abstract

Silica/Titania optical waveguides have been prepared by the sol-gel technique using Glycidoxypropyltrimethoxysilane and tetrapropylorthotitanate as the starting materials. Scanning electron microscopy, atomic force microscopy, thermal gravimetric analysis, differential thermal analysis, and UV- visible spectroscopy have been used to characterize the morphology, the optical and structural properties of the waveguide films. The waveguides are also characterized by measuring their refractive index, thickness, and propagation loss as a function of titanium content and thermal treatment. The obtained results show that after an annealing at 500°C or above, an inorganic silica/titania crack-free film could be obtained. The single layer spin- coated film has high transparency in the visible range and is more than 0.5 micron thick. The propagation loss of the waveguide films was also estimated by using the scattered- light measurement method and was found to be around 1.0 dB/cm at the wavelength of 632.8 nm.

Paper Details

Date Published: 12 November 1999
PDF: 7 pages
Proc. SPIE 3896, Design, Fabrication, and Characterization of Photonic Devices, (12 November 1999); doi: 10.1117/12.370382
Show Author Affiliations
Wenxiu Que, Nanyang Technological Univ. (Singapore)
Yan Zhou, Nanyang Technological Univ. (Singapore)
Yee Loy Lam, Nanyang Technological Univ. (Singapore)
Shi De Cheng, Nanyang Technological Univ. (Singapore)
Yuen Chuen Chan, Nanyang Technological Univ. (Singapore)
Chan Hin Kam, Nanyang Technological Univ. (Singapore)
Liping Zhao, Nanyang Technological Univ. (Singapore)
Srinivasa Buddhudu, Nanyang Technological Univ. (Singapore)

Published in SPIE Proceedings Vol. 3896:
Design, Fabrication, and Characterization of Photonic Devices
Marek Osinski; Soo-Jin Chua; Shigefusa F. Chichibu, Editor(s)

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