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Proceedings Paper

Development of a laser holographic interference lithography system
Author(s): Oki Gunawan; Lui Whye Hoe; Boon Siew Ooi; Yuen Chuen Chan; Yee Loy Lam; Yan Zhou
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Paper Abstract

Fabrication of periodic grating is very important for photonic devices such as Distributed Feedback (DFB) lasers, optical fiber Bragg grating based devices and optical couplers. Here, we report the development of holographic grating techniques utilizing a rotary mirror holder for grating period from 10 μm to 0.5 μm and Fresnel bimirrors for period greater than 1 μm. These holographic technique offers a wide range of tunability, good resolution, relatively simple apparatus, high uniformity and large-coverage of pattern area. A single line HeCd laser was used in these set ups. The grating patterns have been successfully transferred onto GaAs substrate after dry etching with photoresist as mask. In addition, with the insertion of orthogonal Fresnel bimirror in the systems, square grating patterns have been successfully obtained with grating period of 2 μm x 2 μm.

Paper Details

Date Published: 12 November 1999
PDF: 8 pages
Proc. SPIE 3896, Design, Fabrication, and Characterization of Photonic Devices, (12 November 1999); doi: 10.1117/12.370356
Show Author Affiliations
Oki Gunawan, Nanyang Technological Univ. (Singapore)
Lui Whye Hoe, Nanyang Technological Univ. (Singapore)
Boon Siew Ooi, Nanyang Technological Univ. (Singapore)
Yuen Chuen Chan, Nanyang Technological Univ. (Singapore)
Yee Loy Lam, Nanyang Technological Univ. (Singapore)
Yan Zhou, Nanyang Technological Univ. (Singapore)

Published in SPIE Proceedings Vol. 3896:
Design, Fabrication, and Characterization of Photonic Devices
Marek Osinski; Soo-Jin Chua; Shigefusa F. Chichibu, Editor(s)

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