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Proceedings Paper

Binary deposition method using standard CMOS structural layers to fabricate optical gratings and microlenses
Author(s): Lung Jieh Yang; P. C. Liu; Shung-Wen Kang; W. C. Duh; Peizen Chang; Chih-Kung Lee
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Paper Abstract

The binary lithography combined with precise control of RIE (Reactive Ion Etch) could fabricate an 8-level blazed grating with the reflective efficiency above 80% in recent years. The pixel size of the 8-level grating is often designed to be 32 microns or even larger due to the manipulation error of the mask-aligner. By the excellent augmentation of the mask-stepper, which is popular in IC industry, the smaller pixel size or the higher-order levels of the gratings could be achieved ideally.

Paper Details

Date Published: 12 November 1999
PDF: 6 pages
Proc. SPIE 3795, Terahertz and Gigahertz Photonics, (12 November 1999); doi: 10.1117/12.370212
Show Author Affiliations
Lung Jieh Yang, Tamkang Univ. (Taiwan)
P. C. Liu, Tamkang Univ. (Taiwan)
Shung-Wen Kang, Tamkang Univ. (Taiwan)
W. C. Duh, Tamkang Univ. (Taiwan)
Peizen Chang, National Taiwan Univ. (Taiwan)
Chih-Kung Lee, National Taiwan Univ. (Taiwan)


Published in SPIE Proceedings Vol. 3795:
Terahertz and Gigahertz Photonics
R. Jennifer Hwu; Ke Wu, Editor(s)

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