Share Email Print

Proceedings Paper

Binary deposition method using standard CMOS structural layers to fabricate optical gratings and microlenses
Author(s): Lung Jieh Yang; P. C. Liu; Shung-Wen Kang; W. C. Duh; Peizen Chang; Chih-Kung Lee
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The binary lithography combined with precise control of RIE (Reactive Ion Etch) could fabricate an 8-level blazed grating with the reflective efficiency above 80% in recent years. The pixel size of the 8-level grating is often designed to be 32 microns or even larger due to the manipulation error of the mask-aligner. By the excellent augmentation of the mask-stepper, which is popular in IC industry, the smaller pixel size or the higher-order levels of the gratings could be achieved ideally.

Paper Details

Date Published: 12 November 1999
PDF: 6 pages
Proc. SPIE 3795, Terahertz and Gigahertz Photonics, (12 November 1999); doi: 10.1117/12.370212
Show Author Affiliations
Lung Jieh Yang, Tamkang Univ. (Taiwan)
P. C. Liu, Tamkang Univ. (Taiwan)
Shung-Wen Kang, Tamkang Univ. (Taiwan)
W. C. Duh, Tamkang Univ. (Taiwan)
Peizen Chang, National Taiwan Univ. (Taiwan)
Chih-Kung Lee, National Taiwan Univ. (Taiwan)

Published in SPIE Proceedings Vol. 3795:
Terahertz and Gigahertz Photonics
R. Jennifer Hwu; Ke Wu, Editor(s)

© SPIE. Terms of Use
Back to Top