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Proceedings Paper

Modeling of laminar e-beam source for SCALPEL
Author(s): Warren K. Waskiewicz; James Alexander Liddle; Victor Katsap
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Paper Abstract

The SCALPEL e-beam lithography tool requires an extremely uniform e-beam to illuminate the Mask. To meet this requirement, the SCALPEL POL tool source cathode operates in the temperature limited mode. In this mode, all cathode irregularities are imaged at the Mask plane due to the high DOF of the gun immersion objective. We have studied the possibility of Mask illumination with a laminar e-beam having its virtual source located beyond the immersion objective DOF. In this case, using a positively biased Wehnelt, one can obtain a laminar e-beam that provides high emittance and low brightness illumination, while also yielding an efficient in- gun correction of beam properties.

Paper Details

Date Published: 15 November 1999
PDF: 5 pages
Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); doi: 10.1117/12.370140
Show Author Affiliations
Warren K. Waskiewicz, Lucent Technologies/Bell Labs. (United States)
James Alexander Liddle, Lucent Technologies/Bell Labs. (United States)
Victor Katsap, Lucent Technologies/Bell Labs. (United States)


Published in SPIE Proceedings Vol. 3777:
Charged Particle Optics IV
Eric Munro, Editor(s)

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