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Proceedings Paper

Quantitative aberration assessment by a through focal analysis of pattern edge sharpness
Author(s): Xieqing Zhu; Eric Munro; John A. Rouse; Haoning Liu; Warren K. Waskiewicz
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Paper Abstract

In computing the optical properties of electron and ion beam columns, the actual beam blur needs to be obtained from the computed aberration coefficients of the column and the beam parameters. A traditional method, which has successfully been used for many years, computes aberration disks for each individual aberration and obtains overall beam blur by adding these disks in quadrature. However, this method gives no information of beam current densities to compare with experimental measurements. A study of a new simulation method for analyzing pattern edge sharpness is described in this paper. The method involves the simulation of the point spread function ('PSF'), which can be proven to be equivalent to the pattern edge sharpness, provided that the PSF is smaller than the pattern feature. This method provides the current density distribution of the PSF and a quantitative assessment of the aberration, defined in terms of the rise distance of the PSF, in a through-focal series of planes, thereby enabling the best focus plane to be determined. An illustrative example is presented for a typical SCALPELTM column.

Paper Details

Date Published: 15 November 1999
PDF: 12 pages
Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); doi: 10.1117/12.370138
Show Author Affiliations
Xieqing Zhu, Munro's Electron Beam Software Ltd. (United Kingdom)
Eric Munro, Munro's Electron Beam Software Ltd. (United Kingdom)
John A. Rouse, Munro's Electron Beam Software Ltd. (United Kingdom)
Haoning Liu, Munro's Electron Beam Software Ltd. (United Kingdom)
Warren K. Waskiewicz, Lucent Technologies/Bell Labs. (United States)

Published in SPIE Proceedings Vol. 3777:
Charged Particle Optics IV
Eric Munro, Editor(s)

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