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Proceedings Paper

Compact column design for a focused ion-beam lithography system
Author(s): Qing Ji; Tsu-Jae King; Yvette Y. Lee; Ka-Ngo Leung
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Paper Abstract

A focused ion beam system using a multicusp plasma ion source and an all-electrostatic accelerator column design is being investigated for maskless direct-write lithography processes. The all-electrostatic accelerator column is very compact with a total length of 3 cm. It consists of an extraction lens, a collimator aperture, a focusing lens and a deflector. Ion beam transport code IGUN and charged particle optics design software (Munro's code) are used to analyze and optimize the performance of the accelerator column. The column can accelerate an 0.1 (mu) A O2+ ion beam to about 1 keV and focus it down to 0.2 micrometer spot size. Both axial and deflection aberration of the beam are investigated using the OPTICS and SOFEM packages of Munro's code.

Paper Details

Date Published: 15 November 1999
PDF: 8 pages
Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); doi: 10.1117/12.370128
Show Author Affiliations
Qing Ji, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Tsu-Jae King, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Yvette Y. Lee, Lawrence Berkeley National Lab. (United States)
Ka-Ngo Leung, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 3777:
Charged Particle Optics IV
Eric Munro, Editor(s)

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