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Proceedings Paper

Uniform illumination in SCALPEL by imaging the angular distortion
Author(s): Daniel Moonen; M. David Nykerk; Pieter Kruit; Warren K. Waskiewicz
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Paper Abstract

An investigation is presented of the possibility to improve electron-beam uniformity of the SCALPEL system by imaging the angular distribution. First, some calculations are carried out which suggest that this angular distribution image should be corrected to enlarge the area of the beam that is uniform within the specifications. Then an optical system is introduced with which this could be done using spherical aberration, and computer simulation results are presented to illustrate the possibilities of such a system.

Paper Details

Date Published: 15 November 1999
PDF: 8 pages
Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); doi: 10.1117/12.370124
Show Author Affiliations
Daniel Moonen, Delft Univ. of Technology (Netherlands)
M. David Nykerk, Delft Univ. of Technology (Netherlands)
Pieter Kruit, Delft Univ. of Technology (Netherlands)
Warren K. Waskiewicz, Lucent Technologies/Bell Labs. (United States)

Published in SPIE Proceedings Vol. 3777:
Charged Particle Optics IV
Eric Munro, Editor(s)

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