Share Email Print
cover

Proceedings Paper

Mesh-equipped Wehnelt source for SCALPEL
Author(s): Victor Katsap; Warren K. Waskiewicz; Peter B. Sewell; John A. Rouse
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The SCALPEL E-beam lithography tool requires an extremely uniform, high emittance E-beam to illuminate the Mask. The existing SCALPEL source utilizes a pure metal cathode operating in the temperature limited mode, thus having limited total emission current available. The usable emitter size of this cathode is constrained by its direct heating scheme, which sets an upper limit for the beam emittance. Furthermore, to generate a uniform beam, a conventional source should be designed to have a high cut-off voltage, which precludes an efficient electronic beam current control. We have studied the possibility of implementing a large area flat cathode and fine control grid mesh combination, potentially capable of providing high emission uniformity, high beam current and low beam control voltage.

Paper Details

Date Published: 15 November 1999
PDF: 7 pages
Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); doi: 10.1117/12.370117
Show Author Affiliations
Victor Katsap, Lucent Technologies/Bell Labs. (United States)
Warren K. Waskiewicz, Lucent Technologies/Bell Labs. (United States)
Peter B. Sewell, LAB-6 (Canada)
John A. Rouse, Munro's Electron Beam Software Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 3777:
Charged Particle Optics IV
Eric Munro, Editor(s)

© SPIE. Terms of Use
Back to Top