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Proceedings Paper

Taguchi optimization for SU-8 photoresist and its applications in microfluidic systems
Author(s): Jian Zhang; Khee Lip Tan; Lin Jiang Yang; Thomas Haiqing Gong; Guodong Hong; Xiaodong Wang; Longqing Chen
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Paper Abstract

In this paper, the optimization and application results of SU-8 are reported. SU-8 is an ultra-thick, negative, epoxy- type, near UV photoresist based on EPON SU-8 resins from Microchem Corp. SU-8 is a highly photosensitive resist and its properties are greatly affected by the process parameters. The parameters, which have influence on the properties, were optimized by three level, L9 Orthogonal Array of Taguchi Method. Two kinds of photoresists, SU-8 and SU-8 50, and four parameters such as the prebake time, postbake time, exposure time and developing time were chosen to optimize. We found that there exist some minor differences between out result and the published data. This different could be due to either the EPON SU-8 content or the fabrication conditions. According to the optimized data, for SU-8 and SU-8 50, many microstructures with thickness more than 100, 500 micrometers and aspect ratio more than 20, 50 were obtained, respectively. All these were achieve without the introduction of GPL, a stronger developing solution. The positive photoresists AZ9260 with thickness more than 20 micron were patterned as the sacrificial layer. Using SU-8 as the structural layer, we fabricated some micro-components such as micro-cantilevers, microchannels and micro- heatpipes. The primary experiments demonstrated that SU-8 could be used as the structural material for micro- components and even for some MicroElectroMechanical Systems.

Paper Details

Date Published: 9 November 1999
PDF: 8 pages
Proc. SPIE 3899, Photonics Technology into the 21st Century: Semiconductors, Microstructures, and Nanostructures, (9 November 1999); doi: 10.1117/12.369431
Show Author Affiliations
Jian Zhang, Nanyang Technological Univ. (Singapore)
Khee Lip Tan, Nanyang Technological Univ. (Singapore)
Lin Jiang Yang, Nanyang Technological Univ. (Singapore)
Thomas Haiqing Gong, Nanyang Technological Univ. (Singapore)
Guodong Hong, Nanyang Technological Univ. (Singapore)
Xiaodong Wang, Nanyang Technological Univ. (Singapore)
Longqing Chen, Nanyang Technological Univ. (Singapore)


Published in SPIE Proceedings Vol. 3899:
Photonics Technology into the 21st Century: Semiconductors, Microstructures, and Nanostructures
Seng Tiong Ho; Yan Zhou; Weng W. Chow; Yasuhiko Arakawa, Editor(s)

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