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Proceedings Paper

High-energy photon lithography for fabrication of photonic devices
Author(s): Sing Lee; Vladimir A. Kudryashov; Paul Choon Keat Lee; Mahe Liu; Tuck Lee Tan
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Paper Abstract

Photonic crystals an other photonic devices could be efficiently produced using relatively simple and cheap Plasma Focus Pinch x-ray point sources, similar to the NX2. With this point x-ray source, it was demonstrated that with a proximity printing scheme, feature sizes less than 100 nm could be reproduced in a 500 nm UV3 CAR layer.

Paper Details

Date Published: 9 November 1999
PDF: 10 pages
Proc. SPIE 3899, Photonics Technology into the 21st Century: Semiconductors, Microstructures, and Nanostructures, (9 November 1999); doi: 10.1117/12.369405
Show Author Affiliations
Sing Lee, Nanyang Technological Univ. (Singapore)
Vladimir A. Kudryashov, Microelectronics Technology Institute (Singapore)
Paul Choon Keat Lee, Nanyang Technological Univ. (Singapore)
Mahe Liu, Nanyang Technological Univ. (Singapore)
Tuck Lee Tan, Nanyang Technological Univ. (Singapore)


Published in SPIE Proceedings Vol. 3899:
Photonics Technology into the 21st Century: Semiconductors, Microstructures, and Nanostructures
Seng Tiong Ho; Yan Zhou; Weng W. Chow; Yasuhiko Arakawa, Editor(s)

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