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Proceedings Paper

Optical cleanliness specifications and cleanliness verification
Author(s): Irving F. Stowers
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Paper Abstract

Optical cleanliness is important to NIF because it results in beam obscuration and scatter losses which occur in the front- end (containing over 20,000 small optics) and the large- aperture portions of the laser (containing approximately equals 7,300 optics in 192 beamlines). The level of particulate cleanliness necessary for NIF, is similar to the scatter loss due to surface roughness. That is, the scatter loss should not exceed less than or equal to 2.5 X 10-5 per surface. Establishing requirements for optical and structural surface cleanliness needs consideration of both particulate and organic thin-film cleanliness. Both forms of cleanliness may be specified using guidelines specified in Military Standard 1246C and are referred to as cleanliness Levels. This Military Standard is described briefly and displayed in tables and charts. The presence of organic thin-films on structural surfaces is of particular concern if the contaminated surface is near solgel coated optics [solgel coatings provide an antireflection (AR) quality]; or the optic is in a vacuum. In a vacuum, organic contaminant molecules have a much high probability of transporting from their source to a solgel-coated optic and thereby result in the rapid change in the transmission of the antireflection coating. Optical surface cleanliness can be rapidly degraded if a clean optic is exposed to any atmosphere containing an aerosol of small particles. The use of cleanrooms, as described in Federal Standard 209C, minimizes the settling of particulate contaminants and is described using charts and tables. These charts assist in determining the obscuration and scatter loss that can be expected when a clean surface is exposed to various Classes of cleanrooms due to particulate settling.

Paper Details

Date Published: 11 November 1999
PDF: 6 pages
Proc. SPIE 3782, Optical Manufacturing and Testing III, (11 November 1999); doi: 10.1117/12.369233
Show Author Affiliations
Irving F. Stowers, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 3782:
Optical Manufacturing and Testing III
H. Philip Stahl, Editor(s)

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