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Proceedings Paper

Visible light interferometer for EUVL system alignment
Author(s): Richard J. Gaughan
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Paper Abstract

A visible wavelength interferometer has been developed for the alignment of an extreme ultraviolet lithography (EUVL) camera. Although the EUVL camera will operate at 13.4 nm, the alignment is far more conveniently done at visible wavelengths, at ambient pressure. Traditional visible interferometers are not capable of reaching the better than 1 nm accuracy required for EUVL camera alignment; so a phase shifting diffraction-limited interferometer was constructed and used to align and quantify the EUVL wavefront to an accuracy better than (lambda) visible/2000. The interferometer and alignment process are described, and camera wavefront measurements presented.

Paper Details

Date Published: 11 November 1999
PDF: 9 pages
Proc. SPIE 3782, Optical Manufacturing and Testing III, (11 November 1999); doi: 10.1117/12.369216
Show Author Affiliations
Richard J. Gaughan, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 3782:
Optical Manufacturing and Testing III
H. Philip Stahl, Editor(s)

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