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Proceedings Paper

New ion-assisted filtered cathodic arc deposition (IFCAD) technology for producing advanced thin films on temperature-sensitive substrates
Author(s): Michael L. Fulton
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Paper Abstract

An innovative Ion-Assisted Filtered Cathodic Arc Deposition (IFCAD) system has been developed for low temperature production of thin-film coatings. The IFCAD system employs electro-magnetic and mechanical filtering techniques to remove unwanted macroparticles and neutral atoms from the plasma stream. Therefore, only ions within a defined energy range arrive at the substrate surface, depositing thin-films with excellent mechanical and optical properties. Ion- Assisted-Deposition is coupled with Filtered Cathodic Arc technology to enhance and modify the arc deposited thin- films. Using an advanced computer controlled plasma beam scanning system, high quality, large area, uniform IFCAD multi-layer film structures are attained. Amorphous Diamond- Like-Carbon films (up to 85% sp3 bonded carbon; and micro- hardness greater than 50 GPa) have been deposited in multi- layer thin-film combinations with other IFCAD source materials (such as: Al2O3) for optical and tribological applications. Rutile TiO2 (refractive index of 2.8 at 500 nm) has been deposited with this technology for advanced optical filter applications. The new IFCAD technology has been included in development programs, such as: plastic and glass lens coatings for optical systems; wear resistant coatings on various metal substrates, ultra smooth, durable, surface hydrophobic coatings for aircraft windows; EUV coatings for space instrumentation; transparent conductive coatings; and UV protective coatings for solar cell concentrator plastic Fresnel lens elements for space power.

Paper Details

Date Published: 11 October 1999
PDF: 9 pages
Proc. SPIE 3789, Solar Optical Materials XVI, (11 October 1999); doi: 10.1117/12.367562
Show Author Affiliations
Michael L. Fulton, Ion Arc Corp. (United States)

Published in SPIE Proceedings Vol. 3789:
Solar Optical Materials XVI
Carl M. Lampert; Claes-Goeran Granqvist, Editor(s)

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