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Proceedings Paper

Relative variation of stress-optic coefficient with wavelength in fused silica and calcium fluoride
Author(s): Theodore C. Oakberg
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Paper Abstract

Birefringence in refractive components such as lenses has become an increasingly serious problem in semiconductor lithography as exposure wavelength decreases. Most measurements of birefringence are made with visible light but the light used for photolithography is in the UV and deep UV spectral regions. Measurements of the relative variation of stress-optic constants have been made for fused silica and calcium fluoride, the two primary transmissive optical materials used by this industry.

Paper Details

Date Published: 25 October 1999
PDF: 9 pages
Proc. SPIE 3754, Polarization: Measurement, Analysis, and Remote Sensing II, (25 October 1999); doi: 10.1117/12.366332
Show Author Affiliations
Theodore C. Oakberg, Hinds Instruments, Inc. (United States)


Published in SPIE Proceedings Vol. 3754:
Polarization: Measurement, Analysis, and Remote Sensing II
Dennis H. Goldstein; David B. Chenault, Editor(s)

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