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Proceedings Paper

Patterning of nickel-titanium SMA films with chemical etching by a novel multicomponent etchant
Author(s): Guifu Ding; Aibin Yu; Xiaolin Zhao; Dong Xu; Bingchu Cai; Tianhui Shen
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Paper Abstract

The patterning of nickel-titanium SMA thin films was one of critical micromachining issues during developing SMA film devices, now, an excellent etchant for etching of Ni-Ti SMA thin films was developed, therefore, this problem can be solved by photochemical etching easily. The etchant is based on the dilute hydrofluoric acid with several kinds of additives. The etching process is operated at room temperature with the etching rate of (1-5)micrometers /Min. The etched surface is very smooth and the edge of patterned SMA line is exactly the same as that of patterned photoresist. The etch factor is above 1.5 and might be enlarged furthermore. The etchant is stable and the repeatability is also good. This patterning method is compatible with IC processes, so it is easy to design and fabricate any magic pattern for MEMS applications.

Paper Details

Date Published: 1 October 1999
PDF: 6 pages
Proc. SPIE 3892, Device and Process Technologies for MEMS and Microelectronics, (1 October 1999); doi: 10.1117/12.364501
Show Author Affiliations
Guifu Ding, Shanghai Jiao Tong Univ. (China)
Aibin Yu, Shanghai Jiao Tong Univ. (China)
Xiaolin Zhao, Shanghai Jiao Tong Univ. (China)
Dong Xu, Shanghai Jiao Tong Univ. (China)
Bingchu Cai, Shanghai Jiao Tong Univ. (China)
Tianhui Shen, Shanghai Jiao Tong Univ. (China)


Published in SPIE Proceedings Vol. 3892:
Device and Process Technologies for MEMS and Microelectronics
Kevin H. Chau; Sima Dimitrijev, Editor(s)

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