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Proceedings Paper

Nonstandard bleaching behavior in DNQ systems: modeling and lithographic consequences
Author(s): Dan V. Nicolau; Susumu Yoshikawa; Mircea V. Dusa
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Paper Abstract

The beneficial lithographic consequences of the unusual bleaching behavior of the positive DNQ-5-sulfonate based resists doped with imidazole derivatives was investigated. A proposed chemical pathway was the basis for the estimation of the relative molecular absorbance of the intermediate chemical species via semi-empirical quantum mechanics methods. The proposed chemical mechanism is conjunction with the experimentally observed evolution of the resist bleaching versus exposure energy were the basis for the formulation of the modeling equations regarding the evolution of the overall resist absorbance during exposure. These modeling equations were further implemented, together with the estimated molecular absorbance of the intermediate chemical species, in a microlithographic modeling package. Finally, Prolith-based simulations proved how the unusual bleaching behavior of the imidazole-doped DNQ resists is responsible for the positive features of the previously observed features of the Imager Reversal/positive tine lithography, namely dampening of the standing waves and better CD.

Paper Details

Date Published: 1 October 1999
PDF: 8 pages
Proc. SPIE 3892, Device and Process Technologies for MEMS and Microelectronics, (1 October 1999); doi: 10.1117/12.364494
Show Author Affiliations
Dan V. Nicolau, Swinburne Univ. of Technology (Australia)
Susumu Yoshikawa, Osaka National Research Institute (Japan)
Mircea V. Dusa, ASML (United States)

Published in SPIE Proceedings Vol. 3892:
Device and Process Technologies for MEMS and Microelectronics
Kevin H. Chau; Sima Dimitrijev, Editor(s)

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